Tanner European User Group Meeting 2017

The 2017 Tanner User Group Meeting will be a full day event with all delegates invited to join a special user group dinner in the evening. The formal agenda will be published in late September and will include user papers, technology updates from Mentor and a guest presenter.

 

Overview

Share best practise experiences on design and verification challenges with fellow users of Tanner IC & MEMS design solutions.

Discover new techniques for designing advanced silicon and systems.

Be the first to hear of latest news from the Mentor Tanner team.

Join your industry peers and the Tanner teams from Mentor and EDA Solutions at the 2nd Tanner European User Group Meeting.

 

User2User

Delegates are encouraged to join the broader base of Mentor customers from all over Europe at the annual User2User Conference (U2U) which takes place the day before at the same venue.

Tanner User Group delegates travelling internationally are welcome to join U2U anytime during Monday to participate in the conference and enjoy the U2U evening reception.

Both events are free to attend providing valuable learning and networking opportunity within the Mentor community of designers.

 

Agenda

 

Companies speaking include: Eesy IC, Microdul AG, PragmatIC and Productivity Engineering GmbH

 

Registration from 0830 (including pastries and coffee)

 

Morning

  • Welcome
  • 3 x End-user customer presentations
  • Meet the Tanner industry partners
  • Guest presentation - Emerging trends and developments in IIoT and IoT market segments

 

Lunch

 

Afternoon

  • 2 x End user customer presentations
  • Tanner technology – tips, tricks and latest product developments
  • Q&A with Tanner product management

 

Evening reception and dinner

All User Group guests are invited to join Mentor’s Tanner team and EDA Solutions for a special User Group dinner

 

Tanner Industry Partners
Technical experts from leading IP, foundry and OSAT partners are joining the event and will be on hand to answer questions.

 

 

 

 

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